Advances nanodielectric material characterization and scaling for further size reduction in compact ultra-high voltage capacitor prototypes

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The University of Missouri's Center for Physical and Power Electronics (CPPE) have been working on developing compact, high voltage capacitors intended for pulsed power and directed energy applications. The scope of the project was to design a 500kV capacitor with lifetimes of more than 10,000 shots with an energy density goal of 0.4J/cc. The CPPE's proposed solution was to use a proprietary material developed by the CPPE, named MU100. This material had already been demonstrated in reducing high power antennas and has previously demonstrated a ten times volume reduction factor. The MU100 is a nanodielectric, polymer-ceramic composite composed of nanoparticles of barium titanate and a proprietary binding agent. The result of the composite is a material with a high dielectric constant (100 at 1GHz) and high dielectric strength (>100kV/cm). Initial sample testing showed that MU100 makes an excellent candidate for use in high voltage capacitors not only because of its electrical properties, but also due to its consistent performance across a wide temperature range (-40 degrees C to 120 degrees C). The results of the capacitor program were two working prototypes that have both exceeded pre-specified specifications of withstanding >104 pulses with peak voltages of 500kV and >50 percent voltage reversal. In addition to meeting the specifications, the first- and second-generation prototypes had volume size reductions of over 2x's and over 4x's respectively when compared to the commercial capacitor with similar specifications. After successful demonstrations in reducing the size of ultra high voltage capacitors, additional unfunded efforts have been made in the material characterization to design a third generation prototype. This material characterization includes analysis on the volume and thickness of the material, surface roughness, and surface preparation, which will be discussed in this work.

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