Shared more. Cited more. Safe forever.
    • advanced search
    • submit works
    • about
    • help
    • contact us
    • login
    View Item 
    •   MOspace Home
    • University of Missouri-Columbia
    • Graduate School - MU Theses and Dissertations (MU)
    • Theses and Dissertations (MU)
    • Dissertations (MU)
    • 2007 Dissertations (MU)
    • 2007 MU dissertations - Freely available online
    • View Item
    •   MOspace Home
    • University of Missouri-Columbia
    • Graduate School - MU Theses and Dissertations (MU)
    • Theses and Dissertations (MU)
    • Dissertations (MU)
    • 2007 Dissertations (MU)
    • 2007 MU dissertations - Freely available online
    • View Item
    JavaScript is disabled for your browser. Some features of this site may not work without it.
    advanced searchsubmit worksabouthelpcontact us

    Browse

    All of MOspaceCommunities & CollectionsDate IssuedAuthor/ContributorTitleIdentifierThesis DepartmentThesis AdvisorThesis SemesterThis CollectionDate IssuedAuthor/ContributorTitleIdentifierThesis DepartmentThesis AdvisorThesis Semester

    Statistics

    Most Popular ItemsStatistics by CountryMost Popular AuthorsStatistics by Referrer

    Spectroscopic ellipsometry analysis of nanoporous low dielectric constant films processed via supercritical carbon dioxide for next-generation microelectronic devices

    Othman, Maslin, 1977-
    View/Open
    [PDF] public.pdf (2.416Kb)
    [PDF] short.pdf (63.03Kb)
    [PDF] research.pdf (992.3Kb)
    Date
    2007
    Format
    Thesis
    Metadata
    [+] Show full item record
    Abstract
    My research will address issues at the back-end-of-line in microelectronics fabrication, specifically the need for Low-k extendibility. The International Roadmap for Semiconductors (2005) suggested that interconnect insulation must be replaced with a material having an ultra-low dielectric constant (k) of [less than] 2.0 and can withstand rigorous current process integration for the 65 nm technology. Creating porosity in the films produces k-values as low (1.0) air. In this research, supercritical CO[subscript 2] (SCCO[subscript 2]) process is utilized to create pores, remove water, repair plasma-damaged sample and seal pores. These multi-step processing does not only produce low-k film but also create device reliability. S 2 2 pectroscopy ellipsometric (SE) analysis is used to evaluate the performance of each process on porous film. In SE analysis, Cauchy, Bruggeman Effective Medium Approximation and graded models are used to model the processed samples. The depth profile SE analysis demonstrates the individual process performance based on its changes of refractive index (n) throughout the film thickness. SE also provide important film properties like thickness, porosity etc. In addition to SE, Fourier Transform Infra-red (FT-IR), Scanning Electron Microscopy (SEM) and electrical characterizations are used. Results show that SCCO[subscript 2]/co-solvents can extract porogens and remove water effectively at a significantly shorter time ([less than or equal to] 1 hr) and at a low temperature ( [less than or equal to] 160[degrees]C) without thickness shrinkage in contrast with thermal annealing which uses 450[degrees]C and 5 hours without significantly shrinkage. SCCO[subscript 2]/TMCS removes water and terminates silanol group with methyl group, and hence preventing water re-adsorption which increases k. The dense layer on the sample surface that formed through the vapor treatment/HMDS helps to seal pores and prevent metal diffusion. This research also shows that patterning samples prior to porogen/water removal can minimize plasma damages on porous sample.
    URI
    https://doi.org/10.32469/10355/4879
    https://hdl.handle.net/10355/4879
    Degree
    Ph. D.
    Thesis Department
    Electrical and computer engineering (MU)
    Rights
    OpenAccess.
    This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 License.
    Collections
    • Electrical Engineering and Computer Science electronic theses and dissertations (MU)
    • 2007 MU dissertations - Freely available online

    Send Feedback
    hosted by University of Missouri Library Systems
     

     


    Send Feedback
    hosted by University of Missouri Library Systems