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dc.contributor.advisorTriplett, Gregory Edward, 1973-eng
dc.contributor.authorGarud, Niharikaeng
dc.date.issued2008eng
dc.date.submitted2008 Springeng
dc.descriptionThe entire dissertation/thesis text is included in the research.pdf file; the official abstract appears in the short.pdf file (which also appears in the research.pdf); a non-technical general description, or public abstract, appears in the public.pdf file.eng
dc.descriptionTitle from title screen of research.pdf file (viewed on September 2, 2008)eng
dc.descriptionIncludes bibliographical references.eng
dc.descriptionThesis (M.S.) University of Missouri-Columbia 2008.eng
dc.descriptionDissertations, Academic -- University of Missouri--Columbia -- Electrical engineering.eng
dc.description.abstractTechnology is steadily advancing where semiconductors and microelectronics have become such a huge source of revenue and area of technological interest, resulting in reduced device geometries and more complicated microelectronic fabrication methods. In this thesis, high density plasma oxide process has been discussed, which is widely used especially for shallow trench isolations on micro and nano-sized devices. The problem discussed here relates to the process and how it can be easily imbalanced due to inaccurate assumptions and process parameters. Etch-outs, as presented in this thesis, are the root cause of the problem and a model demonstrating various correlations with some noteworthy results has been developed.eng
dc.identifier.merlinb64601468eng
dc.identifier.oclc244796587eng
dc.identifier.urihttps://hdl.handle.net/10355/5622
dc.identifier.urihttps://doi.org/10.32469/10355/5622eng
dc.languageEnglisheng
dc.publisherUniversity of Missouri--Columbiaeng
dc.relation.ispartof2008 Freely available theses (MU)eng
dc.relation.ispartofcommunityUniversity of Missouri-Columbia. Graduate School. Theses and Dissertations. Theses. 2008 Theseseng
dc.subject.lcshMicroelectronics -- Design and constructioneng
dc.subject.lcshSemiconductors -- Design and constructioneng
dc.subject.lcshRandom access memoryeng
dc.subject.lcshSemiconductor storage deviceseng
dc.titleShallow trench isolation process in microfabrication for flash (NAND) memoryeng
dc.typeThesiseng
thesis.degree.disciplineElectrical engineering (MU)eng
thesis.degree.grantorUniversity of Missouri--Columbiaeng
thesis.degree.levelMasterseng
thesis.degree.nameM.S.eng


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