Design Automation and Evaluation Of Emerging 3D – IC Technology Using Stacked Horizontal Nanowires
Abstract
Miniaturization of integrated circuits (ICs) has continuously enabled advancement in modern
technology. This miniaturization trend, also known as Moore’s law, needs to be maintained intact to
meet the current day computational demands. Further miniaturization of transistors below sub 10nm
regime now faces fundamental device scaling and interconnect bottlenecks. These limitations are
alternatively addressed through 3-D integration of ICs, where pre-fabricated dies or wafers are stacked
in a vertical manner. The existing 3-D ICs can be categorized into multilithic and monolithic 3-D
integration approaches. However, both existing approaches provide only incremental density benefits,
and face reliability, thermal management, large area vertical interconnects, and sequential fabrication
challenges. To surpass these challenges, emerging 3-D IC approaches like transistor level Monolithic
3-D, Skybridge 3-D and Stacked Horizontal Nanowire 3-D (SN3D) have been actively pursued in
research and show promising benefits.
Our emerging 3-D IC approach is SN3D, where we envision to integrate circuits into a fabric
of horizontally stacked nanowires. Our team has previously evaluated key requirements and
manufacturing pathway for SN3D as well as designed logic and memory circuits. Nevertheless, any
emerging 3-D IC approach has to find a pathway to fit into IC design phase based on Electronic Design
Automation (EDA) tools before fabrication. In this thesis, we investigate the EDA tool-based design
flow for SN3D and evaluate the SN3D circuits from fundamental cell level (standard cell level) to
system level using industry standard EDA tools from Cadence Design Systems. A standard cell library
containing three cells is designed and benchmarked with 2D CMOS. A system level flow is
implemented for a large-scale arithmetic circuit and benchmarked with 2D CMOS. Our benchmarking
results show 1.11x, 3.11x and 5.24x benefits in terms of power, performance and area with respect to
2D CMOS for a large-scale arithmetic circuit.
Table of Contents
Introduction and motivation -- Emerging 3-D integrated circuits -- Stacked horizontal nanowire based 3-D IC (SN3D) -- Customization of EDA flow for 3-D fabrics -- Benchmarking results for SM3D cell library -- Pathway to system level design -- Conclusion and future work.
Degree
M.S.