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    Temperature and orientation dependence of kinetic roughening during homoepitaxy: A quantitative x-ray-scattering study of Ag

    Elliot, W. C.
    Miceli, Paul F.
    Tse, T.
    Stephens, P. W.
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    [PDF] TemperatureOrientationDependenceKinetic.pdf (108.1Kb)
    Date
    1996
    Format
    Article
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    Abstract
    Kinetic roughening during homoepitaxial growth was studied for Ag(111) and Ag(001). For Ag(111), from 150 to 500 K, the rms roughness exhibits a power law, σ∝tβ over nearly three decades in thickness. β≈1/2 at low temperatures, and there is an abrupt transition to smaller values above 300 K. In contrast, Ag(001) exhibits layer-by-layer growth with a significantly smaller β. These results are the first to establish the evolution of surface roughness quantitatively for a broad thickness and temperature range, as well as for the case where growth kinetics are dominated by a step-ledge diffusion barrier.
    URI
    http://hdl.handle.net/10355/7544
    Citation
    Phys. Rev. B 54, 17938-17942 (1996)
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    • Physics and Astronomy publications (MU)

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