• Nanoscale observation of delayering in alkane films 

    Bai, Mengjun; Knorr, K.; Simpson, M. J.; Trogisch, S.; Taub, Haskell; Ehrlich, S. N.; Mo, Haiding, 1969-; Volkmann, Ulrich G.; Hansen, Flemming Y. (Institute of Physics, 2007-07)
    Tapping-mode Atomic Force Microscopy and synchrotron X-ray scattering measurements on dotriacontane (n-C32H66 or C32) films adsorbed on SiO2-coated Si(100) wafers reveal a narrow temperature range near the bulk C32 melting ...