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dc.contributor.authorHossain, Marufeng
dc.contributor.authorSubramanian, Senthileng
dc.contributor.authorBhattacharya, Shantanu, 1974-eng
dc.contributor.authorGao, Yuanfangeng
dc.contributor.authorApperson, Steven J., 1982-eng
dc.contributor.authorShende, Rajesheng
dc.contributor.authorGuha, Suchieng
dc.contributor.authorArif, Mohammad, 1974-eng
dc.contributor.authorBai, Mengjuneng
dc.contributor.authorGangopadhyay, Keshabeng
dc.contributor.authorGangopadhyay, Shubhraeng
dc.date.issued2007eng
dc.descriptiondoi:10.1063/1.2450672eng
dc.description.abstractCrystallization of amorphous silicon (a-Si) thin film occurred by the self-propagation of copper oxide/aluminum thermite nanocomposites. Amorphous Si films were prepared on glass at a temperature of 250 °C by plasma enhanced chemical vapor deposition. The platinum heater was patterned on the edge of the substrate and the CuO/Al nanoengineered thermite was spin coated on the substrate that connects the heater and the a-Si film. A voltage source was used to ignite the thermites followed by a piranha solution (4:1 of H2SO4:H2O2) etch for the removal of residual products of thermite reaction. Raman spectroscopy was used to confirm the crystallization of a-Si.eng
dc.description.sponsorshipThe authors acknowledge Dr. Hameed A. Naseem, Professor of the University of Arkansas, for providing the a-Si samples. The authors also acknowledge the NSF NIRT (Grant No. 1316-1898-01) for funding this project.eng
dc.identifier.citationJ. Appl. Phys. 101, 054509 (2007)eng
dc.identifier.issn0021-8979eng
dc.identifier.urihttp://hdl.handle.net/10355/8200eng
dc.languageEnglisheng
dc.publisherAmerican Institute of Physicseng
dc.relation.ispartofcollectionElectrical and Computer Engineering publications (MU)eng
dc.relation.ispartofcommunityUniversity of Missouri-Columbia. College of Engineering. Department of Electrical and Computer Engineeringeng
dc.rightsOpenAccess.eng
dc.rights.licenseThis work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 License.
dc.subjectsolid-solid transitionseng
dc.subjectplasma OVD coatingseng
dc.subject.lcshSiliconeng
dc.subject.lcshSemiconductor filmseng
dc.subject.lcshSemiconductorseng
dc.subject.lcshThin filmseng
dc.titleCrystallization of amorphous silicon by self-propagation of nanoengineered thermiteseng
dc.typeArticleeng


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