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    Permittivity enhancement of aluminum oxide thin films with the addition of silver nanoparticles

    Ravindran, Ramasamy
    Gangopadhyay, Keshab
    Gangopadhyay, Shubhra
    Mehta, N.
    Biswas, N.
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    [PDF] PermittivityEnhancementAluminumOxide.pdf (259.5Kb)
    Date
    2006
    Format
    Article
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    Abstract
    Multilayer reactive electron-beam evaporation of thin aluminum oxide layers with embedded silver nanoparticles (Ag-nps) has been used to create a dielectric thin film with an enhanced permittivity. The results show a frequency dependent increase of the dielectric constant κ. Overall stack κ of the control sample was found to be 7.7-7.4 in the 1 kHz-1 MHz range. This is in comparison with κ = 16.7-13.0 over the same frequency range in the sample with Ag-nps. Capacitance-voltage and conductance-voltage measurements indicate the presence of charge capture resulting from the Ag-nps. The authors attribute this dielectric constant enhancement to dipole and space charge polarization mechanisms.
    URI
    http://hdl.handle.net/10355/8202
    Part of
    Electrical and Computer Engineering publications
    Citation
    Appl. Phys. Lett. 89, 263511 (2006)
    Rights
    OpenAccess.
    This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 License.
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    • Electrical Engineering and Computer Science publications (MU)
    • Physics and Astronomy publications (MU)

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