Permittivity enhancement of aluminum oxide thin films with the addition of silver nanoparticles

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Permittivity enhancement of aluminum oxide thin films with the addition of silver nanoparticles

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Title: Permittivity enhancement of aluminum oxide thin films with the addition of silver nanoparticles
Author: Ravindran, Ramasamy; Gangopadhyay, Keshab; Gangopadhyay, Shubhra; Mehta, N.; Biswas, N.
Date: 2006-12-29
Publisher: American Institute of Physics
Citation: Appl. Phys. Lett. 89, 263511 (2006)
Abstract: Multilayer reactive electron-beam evaporation of thin aluminum oxide layers with embedded silver nanoparticles (Ag-nps) has been used to create a dielectric thin film with an enhanced permittivity. The results show a frequency dependent increase of the dielectric constant κ. Overall stack κ of the control sample was found to be 7.7-7.4 in the 1 kHz-1 MHz range. This is in comparison with κ = 16.7-13.0 over the same frequency range in the sample with Ag-nps. Capacitance-voltage and conductance-voltage measurements indicate the presence of charge capture resulting from the Ag-nps. The authors attribute this dielectric constant enhancement to dipole and space charge polarization mechanisms.
URI: http://hdl.handle.net/10355/8202
ISSN: 0003-6951

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