dc.contributor.author | Biswas, N. | eng |
dc.contributor.author | Lubguban, J. A. | eng |
dc.contributor.author | Gangopadhyay, Shubhra | eng |
dc.date.issued | 2004 | eng |
dc.description | doi:10.1063/1.1757019 | eng |
dc.description.abstract | The effects of bias-temperature-stress (BTS) or simply temperature-stress (TS) on nanoporous low-k methylsilsesquioxane films are studied. Initially, the as-given and O2 ashed/etched films exhibit physical adsorption of moisture as revealed from the electrical behavior of the samples after 15 days. The temperature stressing at 170 °C volatilized the adsorbed water but is unable to remove chemisorb and hydrophillic Si-OH groups. As a result, the TS films remain susceptible to moisture. BTS at 170 °C also removes adsorbed water. More important, the surfaces under the metal-insulator structure were dehydroxylated by breaking the chemisorb Si-OH group facilitating the formation of siloxane bonds that prevents adsorption of moisture even after 60 days. | eng |
dc.description.sponsorship | The authors would like to acknowledge Dorel Toma of TEL for providing the samples, and SRC and NSF for funding this research. | eng |
dc.identifier.citation | Appl. Phys. Lett. 84, 4254 (2004) | eng |
dc.identifier.issn | 0003-6951 | eng |
dc.identifier.uri | http://hdl.handle.net/10355/8205 | eng |
dc.language | English | eng |
dc.publisher | American Institute of Physics | eng |
dc.relation.ispartof | Electrical and Computer Engineering publications | eng |
dc.relation.ispartofcollection | University of Missouri-Columbia. College of Engineering. Department of Electrical and Computer Engineering | eng |
dc.rights | OpenAccess. | eng |
dc.rights.license | This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 License. | |
dc.subject | nanoscale materials | eng |
dc.subject | adsorption kinetics | eng |
dc.subject | nanoporous materials | eng |
dc.subject | high-temperature effects | eng |
dc.subject.lcsh | Thin films | eng |
dc.subject.lcsh | Porous materials | eng |
dc.title | Electric field and temperature-induced removal of moisture in nanoporous organosilicate films | eng |
dc.type | Article | eng |