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dc.contributor.authorDai, Pengcheng, 1963-eng
dc.contributor.authorAngot, T.eng
dc.contributor.authorEhrlich, S. N.eng
dc.contributor.authorWang, S. -K.eng
dc.contributor.authorTaub, Haskelleng
dc.date.issued1994eng
dc.descriptionURL:http://link.aps.org/doi/10.1103/PhysRevLett.72.685 DOI:10.1103/PhysRevLett.72.685eng
dc.description.abstractSynchrotron x-ray scattering has been used to investigate the structure and growth of xenon films physisorbed on the Ag(111) surface. For growth under quasiequilibrium conditions, the bulk Xe-Xe spacing is reached at monolayer completion and fcc films of thickness ≥220 Å are observed. Under kinetic growth conditions, intensity oscillations in the specular reflectivity as a function of time demonstrate nearly layer-by-layer growth. Modeling of the intensity at a fixed coverage allows profiling of the Xe/vacuum interface as well as a direct determination of the film's thickness and layer spacings.eng
dc.description.sponsorshipThis work was partially supported by U.S. National Science Foundation Grants No. DMR-8704938 and No. DMR-9011069 (H.T.) and U.S. Department of Energy Grant No. DE-FG02-85ER45183 of the MATRIX participating Research Team (S.N.E. and H. T.).eng
dc.identifier.citationPhys. Rev. Lett. 72, 685-688 (1994)eng
dc.identifier.issn0031-9007eng
dc.identifier.urihttp://hdl.handle.net/10355/8791eng
dc.languageEnglisheng
dc.publisherAmerican Physical Societyeng
dc.relation.ispartofcollectionUniversity of Missouri--Columbia. College of Arts and Sciences. Department of Physics and Astronomy. Physics and Astronomy publicationseng
dc.subject.lcshSurface chemistryeng
dc.subject.lcshX-rays -- Diffractioneng
dc.subject.lcshX-rays -- Scatteringeng
dc.subject.lcshTexture (Crystallography)eng
dc.titleStructural perfection in physisorbed films: A synchrotron x-ray diffraction study of xenon adsorbed on the Ag(111) surfaceeng
dc.typeArticleeng


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