Ultrahigh vacuum chamber for synchrotron x‐ray diffraction from films adsorbed on single‐crystal surfaces

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Ultrahigh vacuum chamber for synchrotron x‐ray diffraction from films adsorbed on single‐crystal surfaces

Please use this identifier to cite or link to this item: http://hdl.handle.net/10355/8797

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dc.contributor.author Dennison, J. R.
dc.contributor.author Wang, S. -K.
dc.contributor.author Dai, Pengcheng, 1963-
dc.contributor.author Angot, T.
dc.contributor.author Taub, Haskell
dc.contributor.author Ehrlich, S. N.
dc.date.accessioned 2010-10-15T15:05:56Z
dc.date.available 2010-10-15T15:05:56Z
dc.date.issued 1992-04-08
dc.identifier.citation Rev. Sci. Instrum. 63, 3835 (1992) en_US
dc.identifier.issn 0034-6748
dc.identifier.uri http://hdl.handle.net/10355/8797
dc.description doi:10.1063/1.1143279 en_US
dc.description.abstract An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single‐crystal surfaces using synchrotron x‐ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four‐axis diffractometer and can also be used independently of the x‐ray diffractometer. A low‐current, pulse‐counting, low‐energy electron diffraction/Auger spectroscopy system with a position‐sensitive detector enables in situ characterization of the film and substrate while the sample is located at the x‐ray scattering position. A closed‐cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag(111) surface. en_US
dc.description.sponsorship This research was supported by U. S. NSF Grant Nos. DMR-8304366, DMR-8704938, and DMR-9011069 (H. T.), U. S. Department of Energy Grant No. DE-FG02-85ER45183 of the MATRIX Participating Research Team (S. N. E. and H.T.), University of Missouri Multicampus Weldon Springs Awards (H. T.), and a Research Council Grant of the University of Missouri-Columbia (H. T.). en_US
dc.language.iso en_US en_US
dc.publisher American Institute of Physics en_US
dc.relation.ispartof Physics and Astronomy publications en
dc.subject.lcsh Ultrahigh vacuum en_US
dc.subject.lcsh X-rays -- Diffraction en_US
dc.subject.lcsh Radiation en_US
dc.subject.lcsh Thin films en_US
dc.title Ultrahigh vacuum chamber for synchrotron x‐ray diffraction from films adsorbed on single‐crystal surfaces en_US
dc.type Article en_US
dc.relation.ispartofcommunity University of Missouri-Columbia. College of Arts and Sciences. Department of Physics and Astronomy


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