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dc.contributor.authorGangopadhyay, Keshabeng
dc.contributor.authorGangopadhyay, Shubhraeng
dc.contributor.authorHossain, Marufeng
dc.contributor.meetingnameMissouri Technology Expoeng
dc.date.issued2010-10eng
dc.description.abstractSiCON is a nanocomposite thin film consisting of silicon dioxide, silicon carbide, and carbon nitride nanostructures deposited by plasma-enhanced chemical vapor deposition. SiCON harnesses the beneficial characteristics of silicon dioxide and silicon carbide by employing nanotechnology and materials science to combine these characteristics into a coating that is transparent, high strength, scratch resistant, crack free, and has favorable optical and electrical properties. The coating can be performed at various deposition temperatures from near-ambient to 400[degrees]C without sacrificing the beneficial properties. This characteristic provides the ability to coat on many materials including glass, metals, and plastics. Electrical measurements indicate SiCON has excellent insulating properties and a high breakdown strength greater than 5MV/cm. The coating can also be used in extreme environments, such as high temperature and radioactive environments, without significantly altering the properties of SiCON. Potential Areas of Applications: * High energy density capacitors * Insulating layer for surgical tools, etc. * Chemical- and etch-resistant coating * Anti-reflection and anti-scratch coating for screens and lenses * Coating used in extreme environments like high temperatures or radioactive environmentseng
dc.format.extent1 pageeng
dc.identifier.urihttp://hdl.handle.net/10355/9785eng
dc.relation.ispartofAbstracts (Missouri Technology Expo 2010)eng
dc.relation.ispartofcommunityUniversity of Missouri-Columbia. Missouri Technology Expo. Missouri Technology Expo 2010eng
dc.subjectinsulating propertieseng
dc.subjectprotective coatingeng
dc.titleSiCON nanocomposite dielectric thin film [abstract]eng
dc.typeAbstracteng


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