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dc.contributor.authorRavindran, Ramasamyeng
dc.contributor.authorGangopadhyay, Keshabeng
dc.contributor.authorGangopadhyay, Shubhraeng
dc.contributor.authorMehta, N.eng
dc.contributor.authorBiswas, N.eng
dc.date.issued2006eng
dc.descriptiondoi:10.1063/1.2425010eng
dc.description.abstractMultilayer reactive electron-beam evaporation of thin aluminum oxide layers with embedded silver nanoparticles (Ag-nps) has been used to create a dielectric thin film with an enhanced permittivity. The results show a frequency dependent increase of the dielectric constant κ. Overall stack κ of the control sample was found to be 7.7-7.4 in the 1 kHz-1 MHz range. This is in comparison with κ = 16.7-13.0 over the same frequency range in the sample with Ag-nps. Capacitance-voltage and conductance-voltage measurements indicate the presence of charge capture resulting from the Ag-nps. The authors attribute this dielectric constant enhancement to dipole and space charge polarization mechanisms.eng
dc.description.sponsorshipThe authors thank M. Othman for ellipsometry measurements. They are also grateful for the funding provided by the National Science Foundation Grant No. ECS0223.eng
dc.identifier.citationAppl. Phys. Lett. 89, 263511 (2006)eng
dc.identifier.issn0003-6951eng
dc.identifier.urihttp://hdl.handle.net/10355/8202eng
dc.languageEnglisheng
dc.publisherAmerican Institute of Physicseng
dc.relation.ispartofElectrical and Computer Engineering publicationseng
dc.relation.ispartofcollectionUniversity of Missouri-Columbia. College of Engineering. Department of Electrical and Computer Engineeringeng
dc.rightsOpenAccess.eng
dc.rights.licenseThis work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 License.
dc.subject.lcshDielectric filmseng
dc.subject.lcshPolarization (Electricity)eng
dc.subject.lcshAluminum compoundseng
dc.subject.lcshCapacitance meterseng
dc.titlePermittivity enhancement of aluminum oxide thin films with the addition of silver nanoparticleseng
dc.typeArticleeng


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